Take Action

Home | Faculty & Research Overview | Research

Research Details

The Dual Frontier: Patentable Inventions and Prior Scientific Advance, Science

Abstract

The extent to which scientific advances support marketplace inventions is largely unknown. We study 4.8 million U.S. patents and 32 million research articles to determine the minimum citation distance between patentable inventions and prior scientific advances. The distance metric provides a new typology to characterize fields, funders, institutions, and individuals. It can also inform long-standing ideas about the nature of scientific and technological progress that underpin the modern science and innovation system. Applied across all patents and cited journal articles, we find majority connectivity, where the integrated citation network encompasses the majority of both patents and papers. This feature, together with the indirectness and institutional locus of patent-paper linkages, is consistent with and helps quantify core conceptions of the “linear model” of science. However, consistent with more recent theories of scientific and technological progress, advances along the patent-paper boundary appear strikingly more impactful within their respective domains.

Type

Article

Author(s)

Benjamin F. Jones, Mohammad Ahmadpoor

Date Published

2017

Citations

Jones, Benjamin F., and Mohammad Ahmadpoor. 2017. The Dual Frontier: Patentable Inventions and Prior Scientific Advance. Science.

KELLOGG INSIGHT

Explore leading research and ideas

Find articles, podcast episodes, and videos that spark ideas in lifelong learners, and inspire those looking to advance in their careers.
learn more

COURSE CATALOG

Review Courses & Schedules

Access information about specific courses and their schedules by viewing the interactive course scheduler tool.
LEARN MORE

DEGREE PROGRAMS

Discover the path to your goals

Whether you choose our Full-Time, Part-Time or Executive MBA program, you’ll enjoy the same unparalleled education, exceptional faculty and distinctive culture.
learn more